| Ref.No: | 62304600 |
| Start date: | 15.11.2012 |
| End date: | 03.08.2014 |
| Approval date: | 09.11.2012 |
| Department: | CHEMICAL ENGINEERING |
| Sector: | PROCESS ANALYSIS AND PLANT DESIGN |
| Financier: | POLYTECHNICAL INSTITUTE OF TOULOUSE |
| Budget: | 9.225,00 € |
| Scientific Responsible: | Prof. BOUDOUVIS |
| Email: | boudouvi@chemeng.ntua.gr |
| Description: | COMPUTATIONAL FLUID DYNAMICS-BASED ANALYSIS OF THE TRANSPORT OF MOMENTUM,HEAT AND MASS IN CHEMICAL VAPOR DEPOSITION PROCESSES USED FOR THE GROWTH OF THIN METALLIC FILMS.OF PARTICULAR INTEREST IS THE EFFECT OF THE TEMPERATURE PROFILE ON WAFER /WALL SURFA |
