| Ref.No: | 68081700 |
| Start date: | 01.03.2004 |
| End date: | 31.12.2007 |
| Approval date: | 27.09.2004 |
| Department: | CHEMICAL ENGINEERING |
| Sector: | PROCESS ANALYSIS AND PLANT DESIGN |
| Financier: | ΕΠΕΑΕΚ II, U.P.E.P.TH |
| Budget: | 80.000,00 € |
| Scientific Responsible: | Prof. BOUDOUVIS |
| Email: | boudouvi@chemeng.ntua.gr |
| Description: | THE OBJECTIVE OF THIS PROJECT IS THE ANALYSIS OF THE PERFORMANCE OF CHEMICAL VAPOR DEPOSITION REACTORS, WHICH ARE EXTENSIVELY USED IN MICROELECTRONICS FOR THE MANUFACTURING OF THIN SOLID FILMS. THE REACTANTS ENTER THE REACTOR IN THE GAS PHASE,ARE....... |
